| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q60-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q30-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q20-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q80-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01Q40-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B7-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-681
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F9-7038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F9-7061 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q60-24 |
| filingDate |
1992-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d4bdc0c559816bc10eaf858a8c36c26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f88fdac708abccfb56cd610c928509e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce833f01e13c8f45db8fdbe915ee26ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fc6669302370c8dde4aead237e3cd64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4996c88f7e50586c3208e4af04254e45 |
| publicationDate |
1993-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H05217861-A |
| titleOfInvention |
Position shift detection method and exposure apparatus |
| abstract |
(57) [Summary] [Object] To provide a method and an exposure apparatus for detecting relative displacement between a mask and a wafer with an accuracy of the order of 1 nanometer in an exposure apparatus for microfabrication of a semiconductor. [Structure] Applying the principle of the atomic force microscope, an elastic body supporting the probe is provided on the mask, the tip of the probe is made to face the positioning mark provided on the wafer, and the probe is two-dimensionally positioned on the positioning mark. By performing surface scanning and detecting the amount of displacement from the amount of deformation of the elastic body, the distance between the mask and the wafer in the normal direction and the relative alignment in the lateral direction are performed with an accuracy of the order of 1 nanometer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006112788-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112967965-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6636311-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6640433-B1 |
| priorityDate |
1992-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |