http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05216261-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4af0df9a26ff4aafde7285cbd8eb12f4 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-10 |
| filingDate | 1992-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6edab3b428f357253138f964e9d437a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66758ad4b7a51ffce082fbb8d3ca15d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5585d5d21e2c0a3a5c1119026e2d140d |
| publicationDate | 1993-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05216261-A |
| titleOfInvention | Surface treatment method for electroconductive substrate for electrophotographic photoreceptor |
| abstract | (57) [Abstract] [Purpose] A method for treating the surface of a conductive substrate for an electrophotographic photosensitive member, which can reduce the variation in the surface roughness of the conductive substrate during the honing treatment and can perform the treatment in a short time. I will provide a. When a surface of a conductive substrate for an electrophotographic photosensitive member is roughened by honing treatment, a honing treatment is performed using a polishing agent from which coarse particles are removed as a polishing agent, and a center line average roughness Ra is A rough surface having a maximum width of the recess of 10 μm or less is formed with a thickness of 0.13 μm or more. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007135984-A1 |
| priorityDate | 1992-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.