abstract |
(57) [Summary] [Purpose] A simple and environmentally-friendly developer and stripping agent for free radical-initiated addition-polymerizable photoresists, cationic cured resists and solder masks, and bakrel photoresists. I will provide a. Both the developer and the stripping agent contain in all cases gamma-butyrolactone, propylene carbonate and benzyl alcohol, optionally with a small amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, ethylene glycol monomethyl ether, It contains formamide, nitromethane, propylene oxide, methyl ethyl ketone, acetone and water. |