Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31544 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-5435 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
1992-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b92c76a0eff2c216aa5c1b6f5913e1a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0587aee82e5548dcf8452046f8da90c0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f82d6467bf8113a7f8fada47ffa71dbe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_050abd85579e6e48b47b9ca4482690aa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c4ea8733ef97034d09e57f4e7526eac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13642f865cf2c356ed761bbb62b1fe47 |
publicationDate |
1993-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H05216213-A |
titleOfInvention |
Pellicle |
abstract |
(57) [Summary] (Modified) [Objective] The present invention is used in a semiconductor device such as an LSI or VLSI to prevent dust during manufacturing of a liquid crystal display panel by using an exposure method of 500 nm or less, and has a large adhesive strength. The object of the present invention is to provide a pellicle for lithography which is not deteriorated by light. The pellicle for lithography of the present invention is characterized in that the pellicle film is composed of a polymer adhered to a pellicle frame with a diorganopolysiloxane composition. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004054290-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4493300-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001109131-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9836324-A1 |
priorityDate |
1992-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |