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filingDate 1992-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1993-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H05216213-A
titleOfInvention Pellicle
abstract (57) [Summary] (Modified) [Objective] The present invention is used in a semiconductor device such as an LSI or VLSI to prevent dust during manufacturing of a liquid crystal display panel by using an exposure method of 500 nm or less, and has a large adhesive strength. The object of the present invention is to provide a pellicle for lithography which is not deteriorated by light. The pellicle for lithography of the present invention is characterized in that the pellicle film is composed of a polymer adhered to a pellicle frame with a diorganopolysiloxane composition.
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type http://data.epo.org/linked-data/def/patent/Publication

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