http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05194686-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-02
filingDate 1992-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5018af03823e7e0d0a8c8f31fc32cfbc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7dc1c7209c6d83f403864169e4146dd8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b191aeaf95aec224d422c464a20b4990
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d70f2adbfa05fa4f4f93ac70a751835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_223a37e88d3c21a80b9785ce1e86e7bc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_809ae4ae83a953b8317111269bd83f9b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_515f91aae763e8fc6ff6b00956041b81
publicationDate 1993-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H05194686-A
titleOfInvention Photocurable resist composition, method for producing printed circuit board using the same, and printed circuit board
abstract (57) [Summary] [Purpose] U without peeling or swelling of the resist on the conductor circuit even when immersed in a high temperature, highly alkaline chemical copper plating solution. A V-exposure and development type solder resist is provided to facilitate the production of a high density printed circuit board by the part additive method. [Structure] A photosensitive solder resist composition having resistance to plating is a reaction product of an epoxy resin having an average of a plurality of epoxy groups per molecule and an unsaturated carboxylic acid. An unsaturated compound, another functional unsaturated compound which is liquid at room temperature and has a plurality of ethylene bonds per molecule, a photopolymerization initiator, an epoxy resin effect agent, melamine or its derivative or dicyandiamide, It contains an antifoaming agent, a pigment, and an organic solvent.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100729168-B1
priorityDate 1992-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409010033
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123047
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414972214
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25188
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70916
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413850786
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414871446
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70292631
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1474
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415712384
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID586156
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10435
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415004099
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419525958
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69591
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411326623
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456367111
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10005
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419586265
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416024405
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414885125
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415796183
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7956
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419510188
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415734748
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593775
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456486130
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7955
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12749
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415762576
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24322
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415762488
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419549132
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447979997
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID135408770
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID30976
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419532622
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415730828
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559157
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17100
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID13624
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414880553
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8160
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5355130
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414866734
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419574652
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16680
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24956
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25644
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414886494
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419574667
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415745782
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2374
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16891
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID20453897
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID77455
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID93195
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID19996
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419517663
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10949
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413422671
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70262
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12198144
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419519470
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415713226
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449908837
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6355
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID19042
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62556
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID422027723
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66663
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7064
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474459
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414862891
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419481537
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415792759
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7031
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66837
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415748155
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID77470
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID422795536
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10295
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457556906
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID95220

Total number of triples: 111.