| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ead90443277482e25bf91bfddef2b5a7 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 |
| filingDate |
1991-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc890696ebdfa6da7c8bfa04439e38d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_622d7c33c50f7faf2adf526c83d2bdda
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_439d21e4aa39a8e451eef320fb57e1bf |
| publicationDate |
1993-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H05181274-A |
| titleOfInvention |
Polyimide photosensitive resin |
| abstract |
(57) [Summary] [Purpose] To provide a highly sensitive positive-type polyimide-based photosensitive resin having excellent heat resistance, mechanical properties, and storage stability. [Structure] The following general formula (1): 50 to 99 mol% of the repeating unit represented by the following general formula (2) A photosensitive resin comprising 50 to 1 mol% of a repeating unit represented by: |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0157112-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6887580-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100731856-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106796399-A |
| priorityDate |
1991-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |