http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05166774-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_28ab2241f8ec56c30a295e61ff821c43
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-673
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
filingDate 1991-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b71a52fef26fa3d50d1c98689752dae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ca1d4c61cbe3a4e4c28a9937cceab01
publicationDate 1993-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H05166774-A
titleOfInvention Wafer holding jig
abstract (57) [Summary] (Correction) [Constitution] CVD with an outer surface thickness of 0.2 mm or more -The outer shell 3 is made of SiC, and the outer shell 3 has a hollow shell structure having a hollow portion. Cylindrical ribs 5 are provided to connect the outer skins 3 that face each other across the cavity. The inner side of the tubular rib 5 is an open space 5A penetrating the outer cover 3, and the tubular rib 5 Has a taper shape with an angle of 5 ° or more with respect to the outer skin 3. The outer cover 3 is provided with a base material removing opening 6 for communicating the inside of the hollow portion with the outside. [Effect] Since it is composed only of the chemically stable CVD-SiC dense skin 3, it has excellent corrosion resistance and there is no fear of permeation of the cleaning liquid. Since it is a hollow shell structure, it is lightweight and strong, High rigidity and easy handling. The strength and rigidity are further enhanced by the reinforcing effect of the tubular rib 5. There is no risk of deformation due to heat during the cleaning process. The cleaning liquid is efficiently discharged from the cylindrical rib 5, and there is no problem of remaining cleaning liquid. S for the base material It can be easily manufactured by removing the base material from the opening 6 after forming the iC film.
priorityDate 1991-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
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http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21881765

Total number of triples: 18.