http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05165215-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3af3390937c06df72b00e23a42cf63ef |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-064 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0793 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-184 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 |
| filingDate | 1991-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50aa88412a11bf37235cd33b472eec26 |
| publicationDate | 1993-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05165215-A |
| titleOfInvention | Optically latent imageable solder mask and photosensitive composition |
| abstract | (57) [Summary] (Modified) [Structure] An organic solution in which at least one polymer having a polar group substitution, a photopolymerization initiator, and a crosslinking or polymerizable unsaturated monomer are dissolved, A photosensitive composition developable with an aqueous substance. The composition is developable with an aqueous solution of a weak organic acid after exposure to activating radiation and baking. A mask comprising a cured and optically latent imaged composition of the present invention is used as an optically latent imageable solder mask for a printed circuit board, It is also used as a permanent dielectric mask in the manufacture of fully additive printed circuit boards. [Effect] The composition of the present invention has an unexpected resistance to a strong irritating chemical solution including both a strongly acidic solution and a strongly alkaline solution, and also copper and other metals and many non-conductive substrates. As it adheres to the material, it is also possible for masks of the optically latent imaged composition of the invention to be applied as a temporary mask for many applications. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09102677-A |
| priorityDate | 1990-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 107.