| abstract |
(57) [Abstract] [Purpose] A method that enables in-situ measurement of a film growth process, which was not possible before, when forming oxide superconducting films on various substrates by chemical vapor deposition (CVD). And a device are provided. [Structure] During formation of an oxide superconducting film, s and p of laser light are formed on the film at the Brewster angle of the substrate or film. The polarized light is irradiated alternately and the reflection intensity is measured. [Effect] Since the film thickness, deposition rate, and smoothness of the film being formed can be measured, a smooth and uniform oxide superconducting film can be formed based on these results, which is both work and economical. It is valid. |