| abstract |
(57) [Abstract] [Purpose] Exposure to short-wavelength ultraviolet rays or ionizing radiation can be applied, and it has excellent dry etching resistance. Furthermore, the tolerance in exposure and development with an alkaline aqueous solution can be increased, and a good cross-sectional shape can be obtained. An object of the present invention is to provide a photosensitive composition capable of forming a fine pattern. [Structure] Softening point above 150 ° C and average molecular weight 3000- An alkali-soluble polymer is 8000, a compound that generates an acid when exposed to actinic radiation, have a decomposed substituent with at least one acid, and -COO product after decomposition in alkaline solution - or And a compound which produces —SO 3 — . [Effect] The portion irradiated with actinic radiation can be selectively dissolved and removed in the alkaline developer to form a high-resolution positive pattern. |