| abstract |
(57) [Summary] [Objective] To provide a resist material having excellent resist properties such as sensitivity, resolution, etching resistance and storage stability. In a resist composition containing an alkali-soluble phenol resin, a compound that produces an acid upon irradiation with actinic rays, and a compound that crosslinks in the presence of an acid, the compound that produces an acid upon irradiation with actinic rays is a halogen-containing polyvalent compound. A resist composition comprising a phenol compound. |