Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-00 |
filingDate |
1991-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf0c00ec27553d7294b1124b36ca0a12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6714b5f67f8652dbf9e5d4f210f6a353 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3f7b12d6486335e786045da041448a4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6d0f373c2be10f166d26335c12da74b |
publicationDate |
1993-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H051115-A |
titleOfInvention |
Method for producing polyhydroxystyrene |
abstract |
(57) [Summary] [Object] To provide a novel method for producing polyhydroxystyrene which has a narrow molecular weight distribution and can be controlled to a polymer having an arbitrary molecular weight. [Structure] A method for producing polyhydroxystyrene, which comprises subjecting a tetrahydropyranyloxystyrene monomer represented by to a living anionic polymerization and then removing a tetrahydropyranyl group. [Effect] Polyhydroxystyrene useful as a high-resolution resist material necessary for the manufacture of VLSI or as a polymer blend material can be obtained. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6281318-B1 |
priorityDate |
1991-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |