| abstract |
PURPOSE: To improve developing property, sensitivity, heat resistance and resolution and to obtain a high residual film rate by incorporating an alkali-soluble resin and a specified ester of quinone diazidesulfon acid. n CONSTITUTION: This resin compsn. contains an alkali-soluble resin and at least one kind of quinone diazidesulfon acid ester of phenol compd. expressed by formula I. In formula I, Q is a bivalent group expressed by formula II, bivalent alicyclic hydrocarbon group or bivalent aromatic hydrocarbon group, X 1 -X 20 are same of different hydrogen atom, hydroxyl groups, alkyl groups of 1-4 carbon number, alkoxy groups of 1-4 carbon number (however, at least one of X 1 -X 5 , at least one of X 6 -X 10 , at least one of X 11 -X 15 , at least one of X 16 -X 20 are hydroxyl groups). R 1 and R 2 hydrogen atom, or alkyl groups of 1-4 carbon number. In formula II, R 3 and R 4 are hydrogen atom, hydroxyl groups or alkyl groups of 1-4 carbon number or alkoxy groups of 1-4 carbon number, and n is an integer from 1 to 10. n COPYRIGHT: (C)1992,JPO&Japio |