http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H04342751-A

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filingDate 1991-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b01296f2c53c9876a36a5684fbb3c027
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publicationDate 1992-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H04342751-A
titleOfInvention Antistatic composition for polymeric material
abstract PURPOSE: To provide an antistatic composition for polymeric material having excellent antistatic stability and capable of suppressing the electrification tendency of a polymeric material over a long period. n CONSTITUTION: The objective composition is produced by compounding an inorganic acid salt of an alkali metal to a branched polymer produced by the copolymerization of (A) 5-50wt.% (preferably 10-30wt.%) of a radically polymerizable macromonomer containing a polymer having a number-average molecular weight of 1,000-20,000 and composed of a hydrophobic monomer unit (e.g. methyl methacrylate) as the skeleton, (B) 30-95wt.% (preferably 60-90wt.%) of a compound having a radically polymerizable group on one terminal of a polyoxyethylene containing 3-200 ethylene oxide units [e.g. the compound of formula I or formula II (R 1 is H or methyl; X is H or 1-9C alkyl; m is 3-200)] and (C) 0-50wt.% (preferably 0-30wt.%) of a water-soluble vinyl monomer other than the component B (e.g. p-styrenesulfonic acid alkali metal salt). n COPYRIGHT: (C)1992,JPO&Japio
priorityDate 1991-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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