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filingDate 1991-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6077817c08d0453e692e72ed9bcb7ed
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publicationDate 1992-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H04328551-A
titleOfInvention Photosensitive composition
abstract PURPOSE: To improve exposure visible picture property and enhance photosensitivity by incorporating ortho-quinone diazo compound, specified compound, dystuff changing tone by mutual reaction with a photodissociated product of the compound and inorganic acid. n CONSTITUTION: An ortho-quinone diazide compound, a compound forming acid or radicals by irradiating it with activated ray, a dystuff changing tone by mutual reaction with a photo-dissociated product and inorganic acid. As examples of inorganic acid, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, HBr, HI, H 3 BO 3 , HClO 4 , HClO 3 , HIO 3 , HIO 4 , H 3 AsO 3 , etc., are given, and one or not less than two kinds of these acids are used upon mixing. As examples of compounds forming acid or radicals by irradiating them with activated ray, halomethyl oxiadiazol compound, halomethyl-s-triazine compounds, etc., are given. n COPYRIGHT: (C)1992,JPO&Japio
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