| abstract |
PURPOSE: To obtain the heat-sensitive photosensitive material almost free from ionic impurities and superior in storage stability by incorporating a photosensitive polyimido precursor having specified repeating units. n CONSTITUTION: The photosensitive material contains the photosensitive polyimido precursor having the repeating units each represented by formula I in which X is a divalent organic group; Y is a tetravalent organic group; Z is H or SiR 1 n R 2 R (a-n) and one of Z is SiR 1 n R 2 R (3-n) : R 1 is a group having a functional group dimerizable or polymerizable by light or radiation; R 2 is H or 1-10C monovalent organic group; and (n) is 1, 2, or 3, thus permitting the heat-resistant photosensitive material containing the polyimido precursor to be restrained from contamination of most of ionic impurities, superior in storage stability, and to give a polyimido film superior in heat resistance, electric and mechanical characteristics by irradiation with light or radiation. n COPYRIGHT: (C)1992,JPO&Japio |