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filingDate 1991-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23cfb055bf88286becaa503a8173bab7
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publicationDate 1992-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H04288365-A
titleOfInvention Photopolymer material
abstract PURPOSE: To obtain a photopolymer material which is improved in storage stability and an ability to form a thick film and can give a coating film excellent in photosensitivity and its stability by mixing a specified polymer with a urea compound. n CONSTITUTION: The title material is obtained by mixing a polymer mainly consisting of repeating units of formula I (wherein X is a trivalent or tetravalent organic group; Y is a bivalent organic group; and n is 1-2) with 0.2-1.5 mol equivalents, in relation to the COOH groups of the polymer, urea compound of formula II (wherein R 1 is a group having a functional group which can be dimerized or polymerized by irradiation with light or a radiation; and R 2 and R 3 are each H or a monovalent organic group) as a photosensitive component and optionally a sensitizer having a function of sensitizing the photosensitive group of the urea, a polymerization initiator having a function of initiating polymerization, a photopolymerizable or photodimerizable compound, a functional alcoxilane compound, etc. n COPYRIGHT: (C)1992,JPO&Japio
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0013058-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100645616-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4610596-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014210735-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022145355-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9706463-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008070893-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6808766-B1
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