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filingDate 1990-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbbc98445cb336653fc20f7620a5ddc0
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publicationDate 1992-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H04225818-A
titleOfInvention Method for treating waste gas
abstract PURPOSE: To make nitrogen trifluoride- and/or active fluorides-containing gas harmless. n CONSTITUTION: The gas is brought into contact with silicon nitride at temperatures not lower than 200°C and after that, is washed with aqueous alkali. Waste gas which does not substantially include nitrogen trifluoride and/or active fluorides is obtained. n COPYRIGHT: (C)1992,JPO&Japio
priorityDate 1990-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.