http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H04225354-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate | 1990-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c01999fcbb60f8069c53c92af1a70a40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f2b75c99fda4e28000da74a45b571a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4ee9e177d9138a697451d413c4c9b34 |
| publicationDate | 1992-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H04225354-A |
| titleOfInvention | Photosensitive resin composition and photosensitive element using same |
| abstract | PURPOSE: To form a relief image superior in film adhesion and mechanical strength and high in reliability and precision by incorporating a specified vinyl copolymer, an ethylenically unsaturated compound, and a sensitizer. n CONSTITUTION: The copolymer to be used is obtained by copolymerizing methacrylic acid, the alkyl methacrylate represented by formula I in which R 1 is 1-12 C alkyl, and ethyl acrylate preferably, in a weight proportion of 17-30:30-75:3-30 and has a glass transition point Tg of 50-120°C and a weight average molecular weight of 3×10 4 -2×10 5 . The photosensitive resin composition further contains the ethylenically unsaturated compound and the sensitizer. n COPYRIGHT: (C)1992,JPO&Japio |
| priorityDate | 1990-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.