Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5736c85c1929ce4e9775e836a65d6c05 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B29-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G23-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-16 |
filingDate |
1990-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_772cac30adbf54bf7569851fab7616c7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5fe7693cb45f30a3be4e4f9138aef8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_920ab8091a834db11ecc3418a5937893 |
publicationDate |
1992-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H04219317-A |
titleOfInvention |
Production of titanium oxide thin film |
abstract |
PURPOSE: To form a titanium oxide thin film having uniform crystallinity on a substrate at a low temperature by reacting a titanium halide gas with oxygen gas in a plasma generated by high-frequency electric discharge. n CONSTITUTION: Gas of a titanium halide (e.g. titanium tetrachloride) is made to react with oxygen gas in a plasma generated by high-frequency electric discharge to form a titanium oxide thin film on a substrate made of single crystal of magnesium oxide. A titanium oxide thin film having uniform crystallinity can be formed on the substrate at a low temperature by this process. n COPYRIGHT: (C)1992,JPO&Japio |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0866635-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002009355-A |
priorityDate |
1990-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |