http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H04175753-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
filingDate 1990-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c09e4eb592799dc25ebae75431930015
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9367b67241dab16d2dcd5ad0620f3794
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publicationDate 1992-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H04175753-A
titleOfInvention Photosensitive resin composition material for color filter
abstract PURPOSE: To obtain a color filter which has a short production process, can be developed with water, and has high precision and high durability by containing novolak resin, a photo-active fusion restrainer, a dye and a solvent. n CONSTITUTION: A photosensitive resin composition material is coated on a substrate made of glass with a spinner and the like, it is heated and dried to remove a solvent, a negative mask is put on a coated film on the substrate and radiated with light, it is treated with a developer containing an alkali agent to wash off the unhardened section, and it is washed with water and dried to obtain a color filter. Novolak resin polymerized/condensed with a phenol component containing bisphenol A 50 mol.% or above and an aldehyde component, a photo-denaturated fusion restrainer, and a dye soluble in the solvent and compatible with resin are contained in alkali-soluble resin. The process is shortened, development can be performed in an aqueous solution, high precision and excellent durability are obtained, and no acid is generated. n COPYRIGHT: (C)1992,JPO&Japio
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priorityDate 1990-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 39.