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filingDate 1990-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bd3f70aeaee5ec18eff393ca36eb1d4
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publicationDate 1992-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0413755-A
titleOfInvention Resin composition for sealing semiconductor
abstract PURPOSE: To provide the resin composition having a high glass transition point, excellent moisture resistance and compatibility and excellent low stress characteristics and useful for sealing semiconductors by compounding a specific propargyl etherified resin, a polysiloxane and a maleimide resin. n CONSTITUTION: The resin composition comprises (A) 100 pts.wt. of a propargyl etherified resin of formula I (R 1 is H, CH 3 ; 0<a<100; 0<b,c<100 and a+b+c=100) and/or a propargyl etherified resin of formula II (0<d<100, 0≤e,f<100 and d+e+f=100), 2-100 pts.wt. of a polysiloxane of formula III (X is H, group of formula IV, group of formula V, CH=CH 2 , CH 2 -CH=CH 2 ; R 2 is CH 3 , phenyl, X; n=1-100) and (C) 2-200 pts.wt., preferably 20-150 pts.wt., of a maleimide resin (e.g. N,N'-m-phenylenebismaleimide). n COPYRIGHT: (C)1992,JPO&Japio
priorityDate 1990-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 30.