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filingDate 1990-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1992-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H04122938-A
titleOfInvention Positive type photoresist composition
abstract PURPOSE: To obtain the photoresist compsn. having a particularly wide latitude while maintaining a high resolving power without losing the sensitivity by incorporating an alkaline-soluble novolak resin having a specific degree of dispersion, 1, 2-quinone diazide compd. and a low-molecular compd. having phenolic hydroxyl groups at specific weight % of the novolak resin into the above compsn. n CONSTITUTION: This cmpsn. contains the alkaline-soluble novolak resin having 1.5 o 4.0 ratio of a weight average mol. wt. and number average mol. wt., the 1, 2-quinone diazide compd. and the low-molecular compd. having 12 to 50C in total in one molecule and 2 o 8 pieces of the phenolic hydroxyl group in one molecule at 2 to 30wt.% of the novolak resin. The mol. wt. of the novolak resin refers to the value which is defined with a standard polystyrene as a reference value and is obtd. by gel permeation chromatography. n COPYRIGHT: (C)1992,JPO&Japio
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