http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0399017-A

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filingDate 1990-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da39f63c035ee21f4cdeda1fdedf0ea7
publicationDate 1991-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0399017-A
titleOfInvention Depolymerized deoxyribonucleic acid-containing composition
abstract PURPOSE: To obtain a composition for topical use that contains as active ingredients depolymerized deoxyribonucleic acids, can be used for the reduction of the unaesthetisms of the face skin, due to the couperose, and can be advantageously used also to locally reduce the skin unaesthetisms resulting from a situation of an extended physical stress acting on the above-mentioned legs in the lower limbs. n CONSTITUTION: This composition comprises depolymerized deoxyribonucleic acid having a molecular weight of 10,000-100,000 dalton, preferably 15,000-60,000 dalton, the content of the dry basis of P: 8.0-9.6wt.%, N: 13.0-15.0wt.%, deoxyribose: 17.0-24.0wt.%, adenine: 8.0-11.0wt.%, guanine: 7.0-9.5wt.%, cytosine: 5.5-7.5wt.%, thymine: 8.0-11.0wt.%, (A+G)/(T+C)=0.87-1.01. This composition is topically used to reduce the skin unaesthetisms caused by topical defects in skin and body such as cellulitis, couperose, blood irroration and to locally reduce the skin unaesthetisms resulting from a situation of an extended physical stress acting on the above-mentioned legs and their secondary affections such as tumor or local dilation) in the lower limbs. n COPYRIGHT: (C)1991,JPO
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020510701-A
priorityDate 1989-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 41.