http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0396982-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03H1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1989-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68b62c042785dba6dc51483e0324c1d0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b1d3d1b364a01ae7be164af54b7fb68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56a272dc2a9c09c5aff0c938c2167d10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_815834bcf610c5c7bac1881d56b26961 |
| publicationDate | 1991-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0396982-A |
| titleOfInvention | Hologram recording material |
| abstract | PURPOSE: To obtain a hologram recording material which has high moisture resistance and light fastness by using a polymer contg. a carbazole ring in the unit structure as a base material resin and adding an org. peroxide as a photoreaction initiator and a coumarine compd. as the sensitizer for the photoreaction initiator into the resin. n CONSTITUTION: The subject material incorporates the polymer contg. the carbazole ring in the unit structure as the base material resin and is obtd. by the hologram recording material formed by adding the org. peroxide as the photoreaction initiator and the coumarine compd. as the sensitizer for the photoreaction initiator into this base material resin. The carbazole ring-contg. polymer can be selected optionally from generally used polymers. Kentoperoxide, peroxiketal, etc., are used in about 1 to 20wt.% amt. to be added as the org. peroxide to be added as the photoreaction initiator to the base material resin. Any coumarine compds. having a coumarine structure in the molecule are usable as the coumarine compd. to be used as the sensitizer and are added at about 0.2 to 10wt.% to the base material resin. n COPYRIGHT: (C)1991,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5569565-A |
| priorityDate | 1989-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.