http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0372359-A

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-012
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
filingDate 1990-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e62c01efc3d8e175e3a94943fb7cd61c
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publicationDate 1991-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0372359-A
titleOfInvention Radiation sensitive compound and its production
abstract PURPOSE: To ensure the water developability and satisfactory continuous printing time characteristic of a radiation sensitive compound without deteriorating the sensitivity by using a polymer having plural azido substd. arom. ester groups and plural groups capable of imparting solubility in an aq. or alkaline medium to the compd. n CONSTITUTION: This radiation sensitive compd. is a polymer having plural azido substd. arom. ester groups and plural groups capable of imparting solubility in an aq. or alkaline medium to the compd. Carboxylic acid or sulfonic acid groups and their salts are suitable for use as the groups capable of imparting solubility. Water developability and satisfactory continuous printing time are ensured without deteriorating sensitivity. n COPYRIGHT: (C)1991,JPO
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4705269-B2
priorityDate 1989-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 22.