http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0366661-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C303-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07B63-00
filingDate 1989-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3cb13dee7eaf6c988dc31e2797165d0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df8511dd5c9353ed94fbff3093ebef6a
publicationDate 1991-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0366661-A
titleOfInvention Reduction of sensitivity of strong acid or strong acid composition to water, and strong acid composition of low sensitivity to water
abstract PURPOSE: To reduce the sensitivity of a strong acid to water, and to stabilize a liquid strong acid when exposed to water, by admixing a polar neutral solvent to the strong acid or a strong acid compsn. n CONSTITUTION: This method comprises admixing a polar neutral solvent, e.g. N,N-dimethyl formaldehyde, with a strong acid, e.g. p-toluene sulfonic acid, or a strong acid compsn., by at least 10% pref. 20-65% of the whole volume of the admixt., and exposing the strong acid to water to inhibit crystallization of the strong acid. The liq. strong acids used, e.g. toluene-sulfonic acid composition as a catalyst at various industrial processes contg. polymerization, are very sensitive to water and crystallize in a short time. By this method, sensitivity of liq. strong acid to water is reduced to the extent that it can be exposed to the air without crystallization. n COPYRIGHT: (C)1991,JPO
priorityDate 1989-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 20.