| abstract |
PURPOSE: To allow the coating of a substrate surface with carbon hard films subjected to the prevention of peeling by stresses by alternately forming intermediate layers and the carbon hard films to multiple layers at the time of coating the substrate surface with the carbon hard films. n CONSTITUTION: After the intermediate layer 2 is formed by a reactive ion plating method on the substrate 1 (stainless steel, etc.), the carbon hard film 3 is formed by a plasma CVD method thereon. Further, the intermediate layers 4, 6 and the carbon hard films 5, 7 are alternately laminated thereon. The intermediate layers 2, 4, 6 are constituted of at least one kind of silicon, germanium, titanium, titanium nitride, titanium carbide, zirconium, zirconium nitride, etc. The carbon hard film which is subjected to the prevention of the peeling by the stresses and is improved in the resistance to wear, impact and corrosion is obtd. in this way. n COPYRIGHT: (C)1991,JPO&Japio |