http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H03256048-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e7962109cd4763907b82b66760cd0ae8 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C66-71 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C65-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3477 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 |
| filingDate | 1990-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f24c959f9e770e5f94a9c8f0b2fe877 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de378b2735b819ba6438c2df3cb38cbb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75c9ccc89ebe6802bd8e740707dd7438 |
| publicationDate | 1991-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H03256048-A |
| titleOfInvention | Plating resist peeling preventive agent |
| abstract | PURPOSE: To provide an excellent property to prevent the peeling of the metal of a base material and a resist film and to lower a liquid contaminating property by constituting the above agent of a specific S-triazine dielectric compd. n CONSTITUTION: The plating resist peeling preventive agent is constituted by using the B-triazine dielectric body which consists of an S-triazine ring as its skeleton and in which at least one piece of the substituents R 1 to R 4 are the substituent contg. a functional group, as expressed by formula I, as an essential component. In the formula I, at least one piece of R 1 to R 4 are the substituent contg. the functional group selected from a group consisting of an unsatd. group, epoxy group, hydroxy group, etc., and the remaining substituents denote the unsubstd. or substd. group selected from a group consisting of a hydrogen atom, alkyl group, cycloalkyl group, etc. The excellent compatibility with various kinds of resist agents as well as the excellent property to prevent the peeling of the resist film and the non-contaminating effect of liquid are obtd. in this way. n COPYRIGHT: (C)1991,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019054707-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102341731-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11427551-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010116653-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9458116-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015019777-A1 |
| priorityDate | 1990-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.