http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H03229257-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a
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filingDate 1990-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4777e38204f9f24001cd48b964f0099c
publicationDate 1991-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H03229257-A
titleOfInvention Photosensitive composition
abstract PURPOSE: To make improvement in the adhesibility to a substrate and coatability by incorporating a specified polysiloxane and specified onium salt compd. into the above compsn. n CONSTITUTION: The polysiloxane compd. contg. at least 1 mol% siloxone unit derived from the cyclized thermal addition reaction product of the compds. xpressed by formula I, II, III or IV and the compds. expressed by formula V, VI, VII or VIII and the onium salt compd. expressed by formula IX or X are incorporated into the positive type photosensitive compd. In the formulas I to X, R 1 to R 9 , R 13 denote a hydrogen atom, alkyl group, etc.; X 1 to X 3 denote a hydroxy group or hydrolyzable group; P 1 to P 3 denote a single bond, alkylene group, arylene group, etc.; Y denotes a tervalent arom. group; Q denotes an acid group of ≤12 pka. Y n+2 denotes an arom. ring of (n+2) valency; n denotes 1 to 3 integer; Ar 1 , Ar 2 denotes a substd. or undubstd. aryl group; Z 2 - denotes BF 4- , PF b - , R 10 SO 3 - , etc. The improvement in the adhesibility to the substrate and the coatability is made in this way. n COPYRIGHT: (C)1991,JPO&Japio
priorityDate 1990-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451

Total number of triples: 27.