http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H03223702-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bfdf49224a405be1f7b653c56ebad94 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L35-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1990-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52164c6787db31780afd7526795e868a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f81bb258a2f185e63beab7fc54bc312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_077ad8e8538ed1f552971679bd70d542 |
| publicationDate | 1991-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H03223702-A |
| titleOfInvention | Positive photosensitive material forming lens |
| abstract | PURPOSE: To obtain a lens having excellent heat resistance, solvent resistance and transparency after pattern deformation by incorporating such a thermal hardener which imparts the heat resistance and solvent resistance at the time of reheating after the lens formation into the photosensitive material. n CONSTITUTION: The thermal hardener which imparts the heat resistance and solvent resistance is incorporated into the positive photosensitive material at the time of forming the lens by the heating treatment of the photosensitive material. Namely, the positive type photosensitive material is constituted of an alkaline-soluble resin, a photosensitive agent and the thermal hardener. A polymer which simultaneously has polystyrene skeleton and carboxylic acid or vinyl phenol polymer or the hydrogen addition product of a novolak resin is used for the resin. This material is usable for resist pattern formation by UV rays, for UV rays, X-rays, etc., is excellent in sensitivity and resolution and can form the condenser lens by executing a baking treatment after the pattern formation. The lens formed in such a manner has a high refractive index and has the excellent transparency, heat resistance and solvent resistance. n COPYRIGHT: (C)1991,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001281853-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007145264-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006251464-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5432039-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6451496-B2 |
| priorityDate | 1989-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.