| abstract |
PURPOSE: To obtain antireflection film, which can reduce the reflection of light over wide wave range, by a method wherein solution containing specified monoalkyl trialkoxysilane, polyether and organic solvent is applied onto the surface of base so as to elute the polyether after the dehydration condensation of some part or all of the monoalkyl trialkoxysilane. n CONSTITUTION: Solution containing monoalkyl trialkoxysilane represented by the formula (I), in which R is alkyl group having the number of carbon atoms of 1-4 and R' is alkyl group having the number of carbon of 1-6, polyether and organic solvent is applied onto the surface of base so as to form coated film through the dehydration condensation of some part or all of the monoalkyl trialkoxysilane and, after that, elute the polyether by means of organic solvent from the coated film in order to form antireflection film on the base. As the preferable alkoxy group of the monoalkyl trialkoxysilane, methoxy group, ethoxy group and propoxy group. The preferable polyether is polyethylene glycol having the degree of polymerization of 200-6,000. As the organic solvent, alcohols, ketones, esters or the like is used. n COPYRIGHT: (C)1991,JPO&Japio |