http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H03129846-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e80d21c729aa6ff53bc0452132800c04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 1989-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa39b1f91311ae5683a6a60515c82116 |
| publicationDate | 1991-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H03129846-A |
| titleOfInvention | Probing device |
| abstract | PURPOSE: To prevent dust from falling on the surface of a wafer by a method wherein the surface of the wafer is faced to the direction lower than the wafer or to the lateral direction of the wafer. n CONSTITUTION: The surface of a stage 4a, on which a wafer 1 is fixed and held, is faced downward and a probe card 5 is arranged on the side lower than the stage 4a, whereby for example, when probes 2 come into contact to the surface of the wafer 1, dust heavier than the air does not fall on the surface of the wafer 1 by a natural fall even it the dust falls. If a measurement is performed while the surface of the water 1 is sprayed with clean dry nitrogen gas or the like according to the need, the effect of the measurement is further increased. Thereby, such a fall of dust as the performance of a solid-state image sensing element on the surface of the wafer is deteriorated can be prevented. n COPYRIGHT: (C)1991,JPO&Japio |
| priorityDate | 1989-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.