http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H03109986-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dca153f19868f747eeea612b047a9e7c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f80a7e640992b40ed091f53e7453e77e |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2303-04 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-30 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30 |
filingDate | 1989-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_465135360871abb50e8a249097169e8b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c2c32fbd15f372c5ade6e2e757a68c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e7a1f684501cb113efdc657ddbefc5e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4379c026d154322cd514827f0876ddd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f85309ab6d885449dba85117c227fd97 |
publicationDate | 1991-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H03109986-A |
titleOfInvention | Water flow sterilizer |
abstract | PURPOSE: To stably sterilize a large volume of water flow by adopting the constitution to release the water flow from a slit nozzle to a water flow part by having a well part, the nozzle part and a means for irradiation with electron beams. n CONSTITUTION: The water flow from a water path part 11 is introduced to the well part 12. The head Hm between the top end of the well part 12 and the nozzle part 13 is converted to kinetic energy at the nozzle part 13, by which the water flow is injected from the slit nozzle 13a. Namely, the water flow of a thin film is obtd. at a high velocity. The water flow of the thin film is released to the release part 14 existing in the position higher than the nozzle 13a. The water flow is irradiated with the electron beams from a scanning horn 15 and is thereby sterilized at the time of releasing the water flow of the thin film. The slit width of the nozzle 13a is adjusted by a slit width adjusting valve to a change in the water flow from this well part 12 so that the stable water film and injection height are maintained. n COPYRIGHT: (C)1991,JPO&Japio |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6713771-B2 |
priorityDate | 1989-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962 |
Total number of triples: 20.