http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H025513-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
filingDate 1988-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_166d1e11006e710b945dfb642ed7ad40
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9daa4930d557a5931a817c98c505926d
publicationDate 1990-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H025513-A
titleOfInvention Manufacture of semiconductor thin film
abstract PURPOSE: To selectively produce high quality crystals by a method wherein a material in vapor state is excited by microwave electron cyclotron resonance plasma to be crystal-deposited and the excited material is simultaneously carried to a substrate crystal by divergence magnetic field so that the excited material carried may be selectively crystal-deposited only on the exposed part on the surface of the substrate crystal. n CONSTITUTION: A divergence magnetic field is provided with the magnetic field distribution diminishing the intensity of magnetic field from a cavity resonance type plasma 8 producing chamber 7 in the substrate crystal direction. Masking material made of line and space type silicon oxide formed by photolithography are provided on a GaAs substrate 21 and then GaAs single crystals 23 are selectively formed only on the GaAs substrate 21. At this time, as for the microwave electron cyclotron resonance plasma source, arsine diluted with hydrogen (AsH 3 ) is led in so that gallium may be evaporated from a solid material evaporating cell 6 to be crystal-deposited. n COPYRIGHT: (C)1990,JPO&Japio
priorityDate 1988-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 23.