http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0249011-A

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filingDate 1988-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a54053545977dc254a70f01de653ac6
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publicationDate 1990-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0249011-A
titleOfInvention Resist for processing with high energy beam
abstract PURPOSE: To obtain the title resist consisting of an aromatic vinyl monomer component and vinyl monomer component having chlorine-substituted benzoic acid residue at side chain, having sufficient sensitivity to high energy beams and improved in resolving properties. n CONSTITUTION: The aimed resist consisting of a copolymer of (A) 94-98mol% aromatic vinyl monomer component (e.g., styrene) and (B) 6-2mol% vinyl monomer having a chlorine substituted benzoic acid residue expressed by the formula (Cl is bonded at o-position or p-position) at side chain. Furthermore, the component B includes e.g., a compound obtained by linking a O- or P-chlorobenzoic acid residue through an epoxy group to an epoxy group-containing vinyl monomer such as glycidyl methacrylate. n COPYRIGHT: (C)1990,JPO&Japio
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Total number of triples: 34.