http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02311845-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03D13-00
filingDate 1989-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a9bd70a4bb145fecc58f04c2de1232c
publicationDate 1990-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H02311845-A
titleOfInvention Method for cleaning photographic processing device
abstract PURPOSE: To make it possible to rapidly clean a photographic processing device used for photographic processing by cleaning the device with an aq. soln. contg. the ferric chelate salt of aminopolycarboxylic acid and a complexing agent. n CONSTITUTION: A photographic processing device is cleaned with an aq. soln. contg. the ferric chelate salt of aminopolycarboxylic acid and a complexing agent. The ferric chelate salt may be that of iminodiacetic acid (IDA), glycol ether tetraacetic acid (DEDTA) or 1,3-propanediaminetetraacetic acid (1,3-PDTA) or that of ethylenediaminetetraacetic acid (EDTA), 1,2-diaminopropanetetraacetic acid (Me-EDTA) or 1,2-cyclohexanediaminetetraacetic acid (Cy-DTA) having slightly weak oxidizing power. Contaminants sticking to the device are perfectly removed. n COPYRIGHT: (C)1990,JPO&Japio
priorityDate 1989-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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