http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02292304-A

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filingDate 1989-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c158794864af384f8d1070d27742442
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publicationDate 1990-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H02292304-A
titleOfInvention Prevention of deposition of polymer scale
abstract PURPOSE: To prevent the deposition of polymer scale irrespectively of the polymerization conditions by polymerizing an ethylenically unsaturated monomer in a polymerizer having an inside wall coated with a film containing a reaction product of a specified compound with a tannin and a dye or a pigment. n CONSTITUTION: A process for preventing the deposition of polymer scale in the polymerization of an ethylenically unsaturated monomer in a polymerizer, wherein said polymerization is performed in a polymerizer having an inside wall coated with a film containing at least one member selected from a reaction product (A) of a tannin with an aldehyde and a dye or a pigment (B). Examples of the tannin desirably used include tannic acid, Chinese gallotannin, Turkish gallotannin and kaki-shibu tannin. Examples of the aldehyde desirably used include formaldehyde, acrolein and benzaldehyde. n COPYRIGHT: (C)1990,JPO&Japio
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priorityDate 1989-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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