http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02216154-A

Outgoing Links

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filingDate 1989-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_220f97f47299285ea9704fd1cff9a03f
publicationDate 1990-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H02216154-A
titleOfInvention Photosensitive composition, one-stage process for forming optically stable hologram and formation of photoresist on substrate
abstract PURPOSE: To extend the photosensitivity of a compsn. to the long wavelength part of a visible spectrum by incorporating a specified sensitizer. n CONSTITUTION: This compsn. contains a compd. represented by formula I as a sensitizer, an ethylenic unsatd. compd. capable of initiating addition polymn. under free radicals and a chain transfer agent. In the formula I, each of (p) and (q) is 0 or 1, each of R 1 and R 2 is H or R 1 +R 2 is -CHR 11 CHR 12 -, etc., each of R 11 and R 12 is H or a bond for forming an arom. ring, each of R 3 and R 4 is 1-6C alkyl or (un)substd. phenyl, each of X and Y is O, S, etc., and each of R 5 -R 10 is 1-6C alkyl, 1-6C alkoxy, etc. A compd. represented by formula II may be used as the compd. represented by the formula I. This compsn. can be used as a photopolymer material for holography and a dry film material for a photoresist. n COPYRIGHT: (C)1990,JPO
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priorityDate 1988-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 43.