http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02208980-A

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filingDate 1989-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d513a792d2346a54d93d1abd1dcd44e
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publicationDate 1990-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H02208980-A
titleOfInvention Formation of superconductive pattern
abstract PURPOSE: To enable the formation of a superconductive pattern in a simple treating process without using an etching process by a method wherein an organic material film is patterned on a base, a superconductive film is formed thereon, and then the organic material film is removed. n CONSTITUTION: A water tank 1 or a monomolecular film forming device used in the Langumuir-Blodgett's technique is used to control a solution composed of solvent such as benzene acetonitrile or the like in which an organic material is dissolved, and the solution is spread in film over the water surface of the water tank 1. The spread film is prevented from freely spreading on the surface of water by separating plates 3 to control a spread area and the aggregative state of the organic material, and a surface pressure corresponding to the formation of film is obtained through the adjustment by moving the position of the separating plates 3, and the surface pressure is set to a specified value, and a clean board 2 is vertically pulled up or down as the surface pressure is kept at a set value, whereby the organic compound high molecular film spread over the water surface is transferred to the surface of the board 2 to obtain a monomolecular film 4 without executing an etching process. n COPYRIGHT: (C)1990,JPO&Japio
priorityDate 1989-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 23.