http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02160242-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46 |
| filingDate | 1988-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec2e76f3e08de936fde4417b86adec96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d28934f0cec3fb97fe2b9fe8fa38e6c0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e940def392c090ff57ea4159ab90b2e6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1669feac2601717e899f573554533325 |
| publicationDate | 1990-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H02160242-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | PURPOSE: To obtain a solder mask having high reliability which can be developed with aq. alkali having high safety, and has high preservation stability, high definition, and high heat resistance to soldering at wet state by constituting a photosensitive resin compsn. of a specified oligomer, a specified unsatd. compd., an amino resin, a sensitizer, and a heterocyclic compd. having one thiol group. n CONSTITUTION: The photosensitive resin compsn. contains an oligomer having a carboxyl group and a photoreactive unsatd. group in a side chain and being soluble in aq. alkali, an unsatd. compd. obtd. by allowing triglycidyl isocyanurate to cause addn. polymn. with a monocarboxylic acid having an unsatd. group in 1.0-1.1 acid equiv./epoxy equiv., an amino resin, a sensitizer and/or a sensitizing mixture generating free radicals by the irradiation with active rays, and a heterocyclic compd. having one thiol group. Thus, a solder mask having high reliability, high definition, and high heat resistance at wet state is obtd. wherein an aq. alkali having higher safety can be used for development. n COPYRIGHT: (C)1990,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014157720-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6649321-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4998261-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012068652-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012093784-A |
| priorityDate | 1988-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 80.