http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01309352-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F17-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 |
| filingDate | 1988-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_894a08bedd558e215e550ca969d8fc99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb27eacb28187ba55b9fa59849dd9fe3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_570c0fbaa43485d6f792571cfe34413c |
| publicationDate | 1989-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H01309352-A |
| titleOfInvention | Optimum design support apparatus of lsi aluminum wiring part film structure |
| abstract | PURPOSE: To sharply shorten the duration to produce a condition for a new process caused by a miniaturization by a method wherein a crack to be produced in a process to form an aluminum wiring part and an interlayer insulating film for the manufacture of a semiconductor is estimated in advance by using a simulation model. n CONSTITUTION: A cross-sectional scanning electron micrograph 100 with reference to a multilayer film structure in an aluminum wiring part is converted into an image data 201 by means of an image reader 200; a boundary line of individual films is extracted by image processing. When an inside region of the individual films is divided appropriately into meshes, a mesh division data 401 with reference to a cross-sectional structure of an object to be evaluated is obtained. When the data 401 and a value of physical properties of the individual films to be input from a condition input part 500 are given, a stress, a strain and the like of a structure can be analyzed by means of a thermoelastic model 600. A stress intensity factor 601 as a destruction evaluation parameter is computed from these various data and is given to a crack generation evaluation part 700. By this setup, it is possible to sharply shorten the duration to produce a condition for a new process caused by a miniaturization. n COPYRIGHT: (C)1989,JPO&Japio |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7542817-B2 |
| priorityDate | 1988-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804 |
Total number of triples: 17.