| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb4ee28d43b5e8d4a3c5141fa9bcfeb0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K23-007 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C41-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-63
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K23-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C67-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-12 |
| filingDate |
1988-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8663e19cd1484c301f23ae0849601741
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_928ec4e79c5e194ae030c641c5e68f83
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_285812faa822a9e4d834af71d48f4e6d |
| publicationDate |
1989-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H01308242-A |
| titleOfInvention |
Fluorine-containing polyether and fluorine nonionic surfactant |
| abstract |
NEW MATERIAL:A fluorine-containing polyether shown by the formula Rf-X-A (Rf is group containing perfluoroalkyl polyether group; X is CF 2 COO, C 2 F 4 COO or CF 2 CF 2 ; A is group containing polyalkylene glycol group). n EXAMPLE: Compound shown by the formula. n USE: Especially an antistatic agent, surfactant for polymerization and water-soluble nonionic surfactant useful as car wax or film additive. n PREPARATION: A compound shown by the formula Rf-X-H is reacted with a compound shown by the formula HO-A or a compound shown by the formula Rf-X-I is reacted with a compound shown by the formula M-A (M is alkali metal) to give a compound shown by formula Rf-X-A. This compound is usable as an antistatic agent for perfluoropolyether because this compound is compatible with perfluoropolyether. The surface of resin can be improved by using this compound as an additive for resin, especially for resin film. n COPYRIGHT: (C)1989,JPO&Japio |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9541826-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0515687-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5962117-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019522077-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015210790-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5218066-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008099873-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5759968-A |
| priorityDate |
1988-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |