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filingDate 1988-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3641d64ef4c862922630eecd08f5e1b
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publicationDate 1989-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H01290638-A
titleOfInvention Production of 1,1,1-trifluoro-2,2-dichloroethane
abstract PURPOSE: To obtain the subject compound useful as a substitute for trichlorofluoromethane because of the nature free from destruction problem of the ozone in stratosphere, at a low cost, by chlorinating 1,1,1-trifluoro-2- chioroethane with chlorine gas. n CONSTITUTION: 1,1,1-Trifluoro-2,2-dichloroethane can be produced in high selectivity on an industrial scale at a low cost, by chlorinating 1,1,1-trifluoro-2- chloroethane with chlorine gas in the presence or absence of a catalyst consisting of a metal salt, preferably a metal fluoride or metal chloride such as CrF 3 , CuCl 2 , NiCL 2 or FeCl 2 supported on a metal oxide, aluminum fluoride or activated carbon, especially on aluminum fluoride. The ra;w material of the present process can be easily produced by fluorinating trichloroethylene with anhydrous hydrogen fluoride in vapor phase or liquid phase. n COPYRIGHT: (C)1989,JPO&Japio
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