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filingDate 1989-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd14ef63b49919401993c063f9a24b9c
publicationDate 1989-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H01249809-A
titleOfInvention Increased sensitivity photoinitiation composition
abstract PURPOSE: To obtain the subject composition which contains an acridine compound which can generate a free radical by the radiation of chemical light and an organic peroxide, is useful for manufacturing the photosensitive element of a projection speed-type lithography and whose effective sensitivity is increased. n CONSTITUTION: This composition contains (A) an acridine or quinoxilaine or phenazine compound (pref. 9-phenyl acridine) which can generate the free radical by the radiation of chemical light and (B) at least one type of organic peroxide or peracid ester compound (pref. dibenzoyl peroxide, di-t-butyl diperoxyphthalate, t-butyl perbenzonate and 1-t-butyl pernaphthonate) in a ratio of 99:1 to 1:99. n COPYRIGHT: (C)1989,JPO
priorityDate 1988-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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