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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 1988-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_390f927e8c42f12cbb15a388acf087f2
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publicationDate 1989-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H01219737-A
titleOfInvention Pattern forming material
abstract PURPOSE:To improve sensitivity, resolution, resistance to oxygen plasma, and preservation stability of a pattern forming material by dissolving a specified silicone resin in an org. solvent. CONSTITUTION:A pattern forming material is prepd. by dissolving a silicone resin expressed by the formula wherein R1 is a 1-5C alkyl group or 2-6C alkenyl group; R2 is a divalent aromatic hydrocarbon group; each (m) and (n) is an integer 0-100,000; (m+n) is >=10. Preferred org. solvents are aromatic solvents such as toluene, hexane, etc., or alcoholic or ketonic solvents. Preferred concn. of the silicone resin is 1-50wt.%. R2 is most pref. phenylene.
priorityDate 1988-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.