http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01206330-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 1988-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f704dd97aeb706fc103bb4abcb551ef5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f9a811f00a250161d942b2946f572a5 |
| publicationDate | 1989-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H01206330-A |
| titleOfInvention | Photosensitive composition |
| abstract | PURPOSE:To improve the balance of the definition and the anti-dryetching property in the title composition by composing the composition of a silicon polymer having specified unit and weight average mol.wt. and an aromatic azide compd. having the sensitivity against far UV rays having a specified wavelength. CONSTITUTION:The photosensitive composition is composed of the silicone polymer having the unit shown by formula I and the weight average mol.wt. of 3,000-30,000, and the aromatic azide compd. having the sensitivity against the far UV rays of <=300nm wavelength. In formula I, R1 and R2 are each a lower alkylene group, R3-R8 are each hydrogen atom, hydroxyl, methyl or methylol group, R9-R12 are each a lower alkyl group, R13 is CH2 or CH2 OCH2 group, E is phenol or a phenol derivative having 1-3 substituting groups, X is a number of 0<X<=1, Y is a number of (1-X). Thus, the balance of the good definition and the anti-dryetching property of the composition is improved. |
| priorityDate | 1988-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.