| abstract |
PURPOSE:To obtain a resist having high sensitivity and high resolution by using a specified polymer in an upper layer resist of a two layered resist. CONSTITUTION:The afore-mentioned specified polymer has a linear bond expressed by formula I and a bond expressed by formula II, in its molecule. Said bonds transform to SiO2 by oxygen plasma and provide an intense absorption peak only in a far ultraviolet region, accordingly, the polymer is preferred as a material to be incorporated into a single layered resist or an upper layer of two layered resist for far ultraviolet ray lithography. Moreover, all ambient instruments of stepper are made suitable for use by only changing a light source and an optical system in a far ultraviolet exposure. Thus, a resist having high sensitivity and satisfactory definition is obtd. |