http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01191858-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_49308e8718b2bc5be941bc5b7a1d2443 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G5-147 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-147 |
filingDate | 1988-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20f216d32df6bdde49bdb5afbb136909 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90eefa5ce43e9ba951ecbc0a92f14c82 |
publicationDate | 1989-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H01191858-A |
titleOfInvention | Electrophotographic sensitive body and production thereof |
abstract | PURPOSE:To enhance the wear resistance of a photosensitive body and to prolong the life thereof by providing a plasma-polymerized protective film contg. micropores onto a photosensitive layer on a conductive substrate. CONSTITUTION:The photosensitive layer 2 consisting of Se, Se-Te alloy, As2Se3, Sb2Se3, a-Si, CdS, GaAs, ZnO or an org. material such as copper phthalocyanine is provided on the conductive substrate 1 consisting of a polymer film with electrodes consisting of metals such as Al and Ni or In-Sn oxide, Ag, Pd, etc. The protective film 5 which is formed by plasma polymn. and contains the many micropores is formed on this layer 2. The film 5 is formed by the plasma polymn. of a counter electrode system capacity bond type using the layer 2 as a cathode electrode. The residual potential is low and the film thickness can be increased with the film into which the many micropores are incorporated. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6342324-B1 |
priorityDate | 1988-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.