| abstract |
PURPOSE:To obtain a KrF excimer laser resist for a two layer resist method satisfying all characteristics such as sensitivity, resolution and oxygen plasma durability by using the photosensitive resin composition incorporated with an alkali soluble org. silicone resin and an aliphatic diazoketone as main components. CONSTITUTION:The photosensitive resin composition incorporated with the alkali soluble org. silicone resin and the aliphatic diazoketone as main components, is preferably usable for the two layer resist method using the KrF excimer laser. The aliphatic diazoketone is exemplified by cholic acid, deoxycholic acid or derivatives shown by formulas I, II and III, derived from lithocholic acid. The alkali soluble org. silicone resin is preferably a resin shown by formula IV. |